Effects of Rapid Recurrent Thermal Annealing on Giant Magnetoresistance NiFe/Ag Multilayers

Chinese Physics Letters

Volumn 20, Issue 12, 2003, Pages 2242-2245

  Wen, Qi Ye ^a   Zhang, Huai Wu ^a   Jiang, Xiang Dong ^a   Tang, Xiao Li ^a   Zhang, Wan Li ^a  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

[No Author keywords available]

Indexed keywords

BINARY ALLOYS; GIANT MAGNETORESISTANCE; GLASS CERAMICS; MULTILAYERS; RAPID THERMAL ANNEALING; TEMPERATURE DISTRIBUTION;

ANNEAL TEMPERATURES; ANNEALED SAMPLES; ANNEALING TEMPERATURES; CERAMIC SUBSTRATES; D.C. SPUTTERING; DC-SPUTTERING; GLASS-CERAMICS; RAPID RECURRENT THERMAL ANNEALING; TEMPERATURE DEPENDENCE; THERMAL ANNEALS;

IRON ALLOYS;

EID: 0345413246     PISSN: 0256307X     EISSN: None     Source Type: Journal    
DOI: 10.1088/0256-307X/20/12/044     Document Type: Article

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