Formation of silicides in a cavity applicator microwave system

Applied Physics Letters

Volumn 83, Issue 19, 2003, Pages 3918-3920

  Thompson, D C ^a   Kim, H C ^a   Alford, T L ^a   Mayer, J W ^a  

^a Arizona State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAVITY APPLICATOR MICROWAVE SYSTEMS; MICROWAVE POWER ABSORPTION;

ABSORPTION; FREQUENCIES; HEAT TREATMENT; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

MICROWAVES;

EID: 0345376822     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1625430     Document Type: Article

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