Fabrication planar coil on oxide membrane hollowed with porous silicon as sacrificial layer

Sensors and Actuators, A: Physical

Volumn 108, Issue 1-3, 2003, Pages 112-116

  Liu, Zewen ^a   Ding, Yong ^a   Liu, Litian ^a   Li, Zhijian ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

CMOS; Inductor; MEMS; Porous silicon; RF; Sacrificial layer

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CMOS INTEGRATED CIRCUITS; CURRENT DENSITY; ELECTRIC COILS; ELECTRIC INDUCTORS; ETCHING; POROUS SILICON;

RADIO FREQUENCY (RF) CIRCUITS; SACRIFICIAL LAYERS;

MICROELECTROMECHANICAL DEVICES;

EID: 0345376785     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(03)00377-7     Document Type: Conference Paper

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