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Volumn 33, Issue 4, 1996, Pages 385-397

Synthesis and cationic photopolymerization of novel cycloaliphatic epoxy monomers based on 5,6-epoxy-1,3-oxepane

Author keywords

3,5,8 trioxabicyclo 5.1.0 octane; 4 vinyl 3,5,8 trioxabicyclo 5.1.0 octane; 5,6 epoxy 1,3 dioxepane; Cationic photopolymerization

Indexed keywords


EID: 0345373265     PISSN: 10601325     EISSN: None     Source Type: Journal    
DOI: 10.1080/10601329608010866     Document Type: Article
Times cited : (4)

References (13)
  • 1
    • 0002105616 scopus 로고
    • (ACS Symp. Ser., 114, R. S. Bauer, Ed.), American Chemical Society, Washington, D.C.
    • J. V. Crivello and J. H. W. Lam, Epoxy Resin Chemistry (ACS Symp. Ser., 114, R. S. Bauer, Ed.), American Chemical Society, Washington, D.C., 1979, p. 1.
    • (1979) Epoxy Resin Chemistry , pp. 1
    • Crivello, J.V.1    Lam, J.H.W.2
  • 2
    • 0013387991 scopus 로고
    • (ACS Symp. Ser., 417, C. E. Hoyle and J. F. Kinstle, Eds.), American Chemical Society, Washington, D.C.
    • J. V. Crivello and J. L. Lee, Radiation Curing of Polymeric Materials (ACS Symp. Ser., 417, C. E. Hoyle and J. F. Kinstle, Eds.), American Chemical Society, Washington, D.C., 1990, p. 398.
    • (1990) Radiation Curing of Polymeric Materials , pp. 398
    • Crivello, J.V.1    Lee, J.L.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.