Surface modification of oxidic nanoparticles using 3- methacryloxypropyltrimethoxysilane

Journal of Colloid and Interface Science

Volumn 269, Issue 1, 2004, Pages 109-116

  Posthumus, W ^a   Magusin, P C M M ^a   Brokken Zijp, J C M ^a   Tinnemans, A H A ^b   Van Der Linde, R ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b TNO   (Netherlands)

Author keywords

3 Methacryloxypropyltrimethoxysilane; Antimony doped tin oxide; Grafting; Nanoparticles; Silica; Tin oxide

Indexed keywords

CONDENSATION; DISPERSIONS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAFTING (CHEMICAL); HYDROGEN BONDS; HYDROLYSIS; MONOLAYERS; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; SILANES; SURFACE TREATMENT; NANOPARTICLES; SILICA; TIN OXIDES;

REACTION RATES; 3-METHACRYLOXYPROPYLTRIMETH-OXYSILANE; ANTIMONY DOPED TIN OXIDES (ATO); ANTIMONY-DOPED TIN OXIDE; AQUEOUS DISPERSIONS; KINETIC EXPERIMENT; NANO-SIZED PARTICLES; RATE DETERMINING STEP; SILICA PARTICLES;

NANOSTRUCTURED MATERIALS; TIN;

3 METHACRYLOXYPROPYLTRIMETHOXYSILANE; ANTIMONY; NANOPARTICLE; OXIDE; SILANE DERIVATIVE; SILICON DIOXIDE; TIN; UNCLASSIFIED DRUG;

ANALYTIC METHOD; AQUEOUS SOLUTION; ARTICLE; CHEMICAL MODIFICATION; CHEMICAL PARAMETERS; CHEMICAL REACTION; HYDROGEN BOND; HYDROLYSIS; INTERMETHOD COMPARISON; KINETICS; NUCLEAR MAGNETIC RESONANCE; PARTICLE SIZE; POLYMERIZATION; PRIORITY JOURNAL; QUANTITATIVE ANALYSIS; SILICON 29 NUCLEAR MAGNETIC RESONANCE; SURFACE PROPERTY;

EID: 0345357156     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2003.07.008     Document Type: Article

References (15)

1. Judeinstein P., Sanchez C. J. Mater. Chem. 6:1996;511-525.
2. Pomogailo A.D. Russ. Chem. Rev. 69:2000;53-80.
3. Miller J.D., Ishida H. Surf. Sci. 148:1984;601-622.
4. Chu L., Daniels M.W., Francis L.F. Chem. Mater. 9:1997;2577-2582.
5. Abboud M., Turner M., Duguet E., Fontanille M. J. Mater. Chem. 7:1997;1527-1532.
6. Daniels M.W., Francis L.F. J. Colloid Interface Sci. 205:1998;191-200.
7. Daniels M.W., Sefcik J., Francis L.F., McCormick A.V. J. Colloid Interface Sci. 219:1999;351-356.
8. Jo H., Blum F.D. Langmuir. 15:1999;2444-2449.
9. Nishiyama N., Shick R., Ishida H. J. Colloid Interface Sci. 143:1991;146-156.
10. Gellermann C., Wolter H., Storch W. Mater. Res. Soc. Symp. Proc. (Nanostruct. Powders Ind. Appl.). 520:1998;185-190.
11. Miller J.D., Ishida H. J. Chem. Phys. 86:1987;1593-1600.
12. Slater B., Catlow C.R.A., Gay D.H., Williams D.E., Dusastre V. J. Phys. Chem. B. 103:1999;10644-10650.
13. Goerl U., Hunsche A., Mueller A., Koban H.G. Rubber Chem. Tech. 70:1997;608-623.
14. Nishiyama N., Horie K. J. Appl. Polym. Sci. 34:1987;1619-1630.
15. Tong Y.Y., Oldfield E., Wieckowski A. Faraday Discuss. 121:2002;323-330.