Structural control of silicon oxide particles by oxygen partial pressure in RF plasma

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 9 A, 2003, Pages 5896-5897

  Sato, Takeshi ^a   Takeda, Atsushi ^b   Kimura, Yuki ^a   Suzuki, Hitoshi ^a   Saito, Yoshio ^c   Kaito, Chihiro ^a  

^a RITSUMEIKAN UNIVERSITY   (Japan)

^b ISI Ltd   (Japan)

^c KYOTO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

High resolution transmission electron microscopy; Infrared spectroscopy; Oxygen partial pressure; RF plasma; Si(C2H5O)4; Silicon oxide particle

Indexed keywords

AMORPHOUS MATERIALS; ARGON; INFRARED SPECTROSCOPY; MIXTURES; MOLECULAR VIBRATIONS; OXYGEN; PARTIAL PRESSURE; PARTICLE SIZE ANALYSIS; PARTICLES (PARTICULATE MATTER); PLASMAS; STRUCTURE (COMPOSITION); TRANSMISSION ELECTRON MICROSCOPY;

HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; OXYGEN PARTIAL PRESSURE;

SILICA;

EID: 0345356559     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.5896     Document Type: Article

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