Influence of grain size on the electrical properties of Sb 2Te3 polycrystalline films

Materials Research Bulletin

Volumn 38, Issue 15, 2003, Pages 1929-1938

  Arun, P ^a   Vedeshwar, A G ^a  

^a UNIVERSITY OF DELHI   (India)

Author keywords

A. Chalcogenides; A. Layered compounds; A. Thin films; B. Vapor deposition; C. X ray diffraction

Indexed keywords

ANTIMONY COMPOUNDS; ELECTRIC PROPERTIES; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION ANALYSIS;

INTERGRANULAR VOIDS; POLYCRYSTALLINE FILMS;

POLYCRYSTALLINE MATERIALS;

EID: 0345327803     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.materresbull.2003.09.019     Document Type: Article

References (22)

1. L.L. Kazmerski (Ed.), Polycrystalline and Amorphous Thin Films and Devices, Academic Press, New York, 1980.
2. Sondheimer E.H. Adv. Phys. 1:1952;1.
3. Mayadas A.F., Shatzkes M. Phys. Rev. B. 1:1970;1382.
4. Rajagopalan N.S., Ghosh S.K. Physica. 29:1963;234.
5. Abou Sekkina M.M. Indian J. Phys. 53A:1979;444.
6. Roy B., Chakraborty R., Bhattacharya R., Dutta A.K. Solid State Commun. 25:1978;617.
7. Damodara Das V., Soundararajan N. J. Appl. Phys. 65:1989;2332.
8. Lefebvre I., Lannoo M., Allan G., Ibanez A., Fourcade J., Jumas J.C., Beaurepaire E. Phys. Rev. Lett. 59:1987;2471.
9. Arun P., Tyagi P., Vedeshwar A.G., Paliwal V.K. Physica B. 307:2001;105.
10. B.D. Cullity, Elements of X-ray Diffraction, 2nd ed., Addison-Wesley, California, USA, 1978.
11. L.I. Maissel, R. Glang, Handbook of Thin Film Technology, McGraw-Hill, New York, 1970.
12. Volger J. Phys. Rev. 79:1950;1023.
13. Ewald A.W. Phys. Rev. 81:1951;607.
14. G.W. Mahlman, W.B. Nottingham, J.C. Slater, Photoconductivity Conference, Wiley, New York, 1957.
15. Petritz R.L. Phys. Rev. 104:1956;1508.
16. Bube R. Appl. Phys. Lett. 13:1956;136.
17. Jerhot J., Snejdar V. Thin Solid Films. 52:1978;379.
18. Seto J.Y.W. J. Appl. Phys. 46:1975;5247.
19. Hurd C.M. J. Phys. C: Solid State Phys. 18:1985;6487.
20. Arun P., Tyagi P., Vedeshwar A.G. Physica B. 322:2002;289.
21. Slater J.C. Phys. Rev. 103:1956;1631.
22. Chih-Huang, C.F. Hsu, Y.C. Chin, C. Chiang, J. Vac. Sci. Technol. A 19 (2001) 1186.