Nitridation process and mechanism of Ti-6Al-4V particles by dc plasma spraying

Physical Chemistry Chemical Physics

Volumn 5, Issue 22, 2003, Pages 5133-5138

  Denoirjean, Alain ^a   Lefort, Pierre ^a   Fauchais, Pierre ^a  

^a UNIVERSITY OF LIMOGES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ALLOY; ALUMINUM DERIVATIVE; NITROGEN; TITANIUM DERIVATIVE; VANADIUM DERIVATIVE;

AEROSOL; ARTICLE; CHEMICAL ANALYSIS; CHEMICAL STRUCTURE; CONTROLLED ATMOSPHERE; DEVICE; DISSOLUTION; GAS; NITRATION; REACTION ANALYSIS; STRUCTURE ANALYSIS; SURFACE PROPERTY; VISCOSITY;

EID: 0345306118     PISSN: 14639076     EISSN: None     Source Type: Journal    
DOI: 10.1039/b311186p     Document Type: Article

References (19)

1. J. Wasilewski and G. H. Kehl, J. Inst. Met., 1955, 82, 94-104.
2. H. A. Wriedt and J. L. Murray, in Binary Alloys Phase Diagrams, ed. Massalki, Am. Soc. Met., Metal Park, OH, USA, 1986, p. 1655.
3. C. Ponticaud, A. Guillou and P. Lefort, Phys. Chem. Chem. Phys., 2000, 2, 1709-1715.
4. Y. Anhok, S. Tobe, H. Tahora and T. Hoshikawa, in Tagungsband Conference Proceedings, ed. A. Lugsheider and P. Kammer, DVS, Germany, 1999, pp. 234-239.
5. H. Tahara, T. Shibata, K. Mitsuo, T. Yoshikawa and Y. Ando, in Thermal Spray: Surface Eng. Via Applied Research, ed. C. C. Berndt, ASM Int., Materials Park, OH, USA, 2000, pp. 21-28.
6. Y. Tsunekawa, M. Hiromnera and Okuniga, J. Therm. Spray Technol., 2000, 9, 83-89.
7. A. Ohmori, Y. C. Zhang and Y. Arata, in Thermal Spray: Research and Applications, ed. T. F. Bernecki, ASM Int., Materials Park, OH, USA, 1991, pp. 605-610.
8. A. Ohmori, S. Hirano and K. Kamada, J. Therm. Spray Technol., 1993, 2, 137-144.
9. M. Suzuki, S. Sodeoka, T. Inone, K. Ueno and T. Valante, in Proc. Int. Thermal Spray Conf., ed. E. Lugsheider, DVS, Essen, Germany, 2002, pp. 605-620.
10. G. Espie, P. Fauchais, B. Hannoyer, J. C. Labbe and A. Vardelle, in 14th Int. Plasma Chem. Conf., ed. M. Hrabovsky, M. Konrad and V. Kopecky, Institute of Physics, Academy of Sciences, Prague, 1999, pp. 2025-2030.
11. G. Espié, J. C. Labbe, A. Vardelle and P. Fauchais, Thin Solid Films, to be published in 2004.
12. H. Ageorges and P. Fauchais, J. High Temp. Mater. Process., 2000, 4, 323-337.
13. O. Lagnoux, A. Denoirjean, A. Grimaud, V. Gourlaouen and P. Fauchais, in 14th Int. Plasma Chem. Conf., ed. M. Harabovsky, M. Konrad and V. Kopecky, Institute of Physics, Academy of Sciences, Prague, 1999, pp. 2057-2062.
14. C. Ponticaud, A. Grimaud, A. Denoirjean, P. Lefort and P. Fauchais, in Thermal Plasma Processes, ed. P. Fauchais, J. Amouroux and M. F. Elchinger, Begell House, NY, USA, 2001, p. 527-536.
15. C. Moreau, P. Gougeon, M. Lamontagne, V. Lecasse, G. Vaudreuil and P. Cielo, in Thermal Spray Industrial Application, ed. C. C. Berndt and S. Sampath, ASM International Materials Park, Ohio, USA, 1994, pp. 431-436.
16. Ph. Roumilhac, J. F. Coudert and P. Fauchais, in Plasma Processing and Synthesis of Materials, ed. D. Apelian and J. Szekely, MRS Pittsburg, USA, 1990, pp. 227-238.
17. S. Nagakura, T. Kusunoki, F. Kakimoto and Y. Hirotsu, J. Appl. Crystallogr., 1975, 8, 65-66.
18. P. Lefort, J. Desmaison and M. Billy, J. Less-common Met., 1981, 77, 1-10.
19. M. Vardelle, A. Vardelle, P. Fauchais and C. Trassy, Rev. Int. Hautes Temp. Réfract., 1989, 25, 121-127.