A Kinetic Model for the Electrolytic Codeposition of α-Al 2O3 Particles with Co-Ni Alloy

Acta Physico - Chimica Sinica

Volumn 19, Issue 11, 2003, Pages 996-1000

  Wu, Gang ^a   Li, Ning ^a   Wang, Dian Long ^a   Zhou, De Rui ^a  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

Al2O3; Adsorption strength; Co Ni alloys; Electrochemical codepositon mechanism; Kinetic model

Indexed keywords

ALUMINUM OXIDE; COBALT; ELECTROLYTE; NICKEL;

ADSORPTION; ARTICLE; DENSITY; ELECTRIC CURRENT; ELECTROCHEMISTRY; ELECTRODE; FORCE; KINETICS; MATHEMATICAL MODEL; ROTATION; STRENGTH; SURFACE PROPERTY;

EID: 0345257060     PISSN: 10006818     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (11)

1. Musiani, M. Electrochim. Acta, 2000, 45: 3397
2. Gay, P. A.; Bercot, P.; Pagetti, J. Surf. Coat. Technol., 2001, 140: 147
3. Gugliemi, N. J. Electrochem. Soc., 1972, 119: 1009
4. Wu, G.; Li, N.; Zhou, D. R. Chinese J. Inorg. Chem., 2003, 19: 739 [(Wuji Huaxue Xuebao), 2003, 19: 739]
5. Wu, G.; Li, N.; Zhou, D. R. Chinese J. Inorg. Chem., 2003, 19: 739 [(Wuji Huaxue Xuebao), 2003, 19: 739]
6. Levin, B. F.; Dupont, J. N.; Marder, A. R. Wear, 2000, 238: 160
7. Celis, J. P.; Roos, J. R.; Buelens, C. J. Electrochem. Soc., 1997, 144: 1402
8. Hovestad, A.; Jansen, L. J. Appl. Electrochem., 1995, 25: 519
9. Wang, D. L.; Li, J.; Dai, Ch. S.; Hu, X. G. J. Appl. Electrochem., 1999, 29: 437
10. Fransaer, J.; Celis, J. P.; Roos, J. R. J. Electrochem. Soc., 1992, 139: 413
11. Celis, J. P.; Fransaer, J. Trans. Inst. Met. Finish, 1997, 75(3): 118