Photochemical acid generation and resist application of camphorsulfonyloxymaleimide copolymers

Journal of Photopolymer Science and Technology

Volumn 9, Issue 4, 1996, Pages 553-556

  Chung, Chan Moon ^a   Ahn, Kwang Duk ^a  

^a Korea Institute of Science and Technology   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0345119736     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.9.553     Document Type: Article

References (10)

1. F. M. Houlihan, T. X. Neenan, E. Reichmanis, J. M. Kometani, and T. Chin, Chem. Mater., 3 (1991) 462.
2. K.-D. Ahn, C.-M. Chung, and D.-I. Koo, Chem. Mater., 6 (1994) 1452.
3. C.-M. Chung, D.-I. Koo, and K.-D. Ahn, J. Photopolym. Sei. Technol, 7 (1994) 473.
4. K.-D. Ahn, J.-S. Koo, and C.-M. Chung, J. Polym. Sei., Polym. Chem. Edn., 34 (1996) 183.
5. J. E. Hanson, E. Reichmanis, F. M. Houlihan, and T. X. Neenan, Chem. Mater., 4 (1992) 837.
6. J. W. Thackeray et al., J. Photopolym. Sei. Technol., 7 (1994) 619.
7. H. Ito, G. Breyta, D. Hofer, T. Fisher, and B. Prime, Proc. SPIE, 2438 (1995) 53.
8. G. Buhr, R. Dammel, and C. R. Lindley, Polym. Mater. Sei. Eng., 61 (1989) 269.
9. W. Brunsvold, R. Kwong, W. Montgomery, W. Moreau, H. Sachdev, and K. Welsh, Proc. SPIE, 1262 (1990) 162.
10. C.-M. Chung, S.-T. Kim, and K.-D. Ahn, J. Photopolym. Sei. Technol., 8 (1995) 179.