Atomic force microscopy evidence of patterning urethane/urea copolymers

Materials Science and Engineering C

Volumn 23, Issue 6-8, 2003, Pages 919-922

  Godinho, M H ^a   Melo, L V ^b   Brogueira, P ^a,b  

^a DEPARTAMENTO DE CIÊNCIA DOS MATERIAIS   (Portugal)

^b INSTITUTO SUPERIOR TÉCNICO   (Portugal)

Author keywords

AFM; Bi stable pattern; Elastomer; Urethane urea; UV

Indexed keywords

ATOMIC FORCE MICROSCOPY; CASTING; CROSSLINKING; DEFORMATION; ELASTOMERS; PLASTIC FILMS; POLYPROPYLENE OXIDES; SHEAR STRESS; SURFACE PROPERTIES; ULTRAVIOLET RADIATION; UREA;

CASTING RATE; URETHANE;

COPOLYMERS;

FILM;

EID: 0345118947     PISSN: 09284931     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.msec.2003.09.164     Document Type: Article

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