Energy shift for core electron levels of chemisorbed molecules observed by X-ray photoelectron spectroscopy in the course of monolayer growth on a Si(111) surface

Langmuir

Volumn 15, Issue 6, 1999, Pages 2099-2102

  Mitsuya, Munehisa ^a   Sato, Naoki ^b  

^a HITACHI LTD   (Japan)

^b KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; BINDING ENERGY; CHEMISORPTION; CRYSTAL ORIENTATION; ELECTRON ENERGY LEVELS; FLUORINE COMPOUNDS; MOLECULAR DYNAMICS; MOLECULAR STRUCTURE; MONOLAYERS; SURFACE STRUCTURE; VAN DER WAALS FORCES; X RAY PHOTOELECTRON SPECTROSCOPY;

CORE-LEVEL ENERGY SHIFT;

SILICON;

EID: 0345103442     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la980346b     Document Type: Article

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