Silicon field emitters coated with diamond-like carbon

Journal De Physique. IV : JP

Volumn 6, Issue 5, 1996, Pages

  Chung, B ^a   Cho, H ^a   Lee, S ^a   Ko, T Y ^a   Lee, J Y ^a   Jeon, D ^a   Lee, K R ^b   Joo, B K ^b   Oh, M H ^b  

^a Myong Ji University   (South Korea)

^b Korea Institute of Science and Technology   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CARBON; CHEMICAL VAPOR DEPOSITION; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CURRENTS; ELECTRON EMISSION; FIELD EMISSION CATHODES; GASES; ION BOMBARDMENT; IONS; SURFACE CLEANING;

DIAMOND LIKE CARBON; EMISSION CURRENT; FIELD EMISSION; PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION; TORR PRESSURE;

SILICON;

EID: 0345033526     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

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