Diamond membrane for X-ray lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2793, Issue , 1996, Pages 225-229

  Noguchi, Hit Shi ^a   Kashida, Meguru ^a   Kubota, Yoshihiro ^b   Takarada, Takayuki ^a  

^a SHIN ETSU CHEMICAL CO LTD   (Japan)

^b GUNMA UNIVERSITY   (Japan)

Author keywords

Chemical vapour deposition; Crystallinity; Diamond membrane; Surface roughness; Transmittance; X ray lithography; X ray mask

Indexed keywords

AMORPHOUS CARBON; CHEMICAL VAPOR DEPOSITION; CRYSTALLINITY; DIAMONDS; ELASTIC MODULI; MASKS; MEMBRANES; PHOTOMASKS; SURFACE ROUGHNESS; TEXTURES; X RAY LITHOGRAPHY;

CARBON AND GRAPHITE; CHEMICAL VAPOUR DEPOSITION; DIAMOND MEMBRANES; HIGH DURABILITY; MEMBRANE FILMS; POLYCRYSTALLINE; TRANSMITTANCE; X RAY MASK;

X RAYS;

EID: 0344976173     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.245216     Document Type: Conference Paper

References (5)

1. W.A.Johnson, R.A.Levy, D.J.Resnick, T.E.Saunders, and A.W.Yanof, "Radiation damage effects in boron nitride mask membranes subjected to X-ray exposures, " J.Vac.Sci.Technol., Vol.B5, No. 1, pp.257-261, 1987.
2. R.E.Acosta, J.R.Maldnado, L.K.Towart, and J.M.Warlaumont, "B-Si mask for storage ring X-ray lithography, "Proc.SPIE, Vol.443, pp.1 14-118, 1983.
3. R.Kumar, T.Ohta, Y.Yamashita, H.Hoga and K.Koga, " Optically High Transparent SiN Mask Membrane with Low Stress Deposited by Low Pressure Chemical Vapor Deposition, " Jpn.J.Appl. Phys., Vol.31, pp.4195-4199, 1992.
4. T.Shoki, Y.Yamaguchi, N.Annaka and I.Amemiya, "Optical properties of poly-crystalline 13-SiC membrane for X-ray mask, " Proc. SPIE, Vol.2254, pp.3 13-319, 1994.
5. H.Windischmann and G.F.Epps, "Properties of diamond membranes for X-ray lithography, " J.Appl.Phys., Vol.68, No. 1 "pp.5665-5673, 1990.