Thermal detrapping analysis of pumping-related defects in diamond

Applied Physics Letters

Volumn 83, Issue 18, 2003, Pages 3707-3709

  Marinelli, Marco ^a   Milani, E ^a   Morgada, M E ^a   Pucella, G ^a   Rodriguez, G ^a   Tucciarone, A ^a   Verona Rinati, G ^a   Angelone, M ^b   Pillon, M ^b  

^a UNIVERSITY OF ROME TOR VERGATA   (Italy)

^b ASSOCIAZIONE EURATOM ENEA SULLA FUSIONE   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ANNEALING; CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; DEFECTS; ELECTRON TRAPS; ELECTRONIC PROPERTIES; IONIZING RADIATION; MICROWAVES; PARTICLE DETECTORS; TEMPERATURE; TRANSPORT PROPERTIES;

ACTIVE CARRIER TRAPPING CENTERS; MICROWAVE CHEMICAL VAPOR DEPOSITION; PUMPING PROCESS; THERMAL DETRAPPING ANALYSIS;

DIAMOND FILMS;

EID: 0344928513     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1623318     Document Type: Article

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