Epitaxial strain effects on the metal-insulator transition in V 2O3 thin films

Solid State Communications

Volumn 129, Issue 4, 2004, Pages 245-248

  Yonezawa, Shigeki ^a   Muraoka, Yuji ^a   Ueda, Yutaka ^a   Hiroi, Zenji ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

A. Thin film; B. Epitaxy; D. Anderson localization; E. Strain

Indexed keywords

ALUMINA; ELECTRIC CONDUCTIVITY; EPITAXIAL GROWTH; LITHIUM COMPOUNDS; METALLIC FILMS; STRAIN; STRESS ANALYSIS; SUPERCONDUCTING TRANSITION TEMPERATURE; VANADIUM COMPOUNDS;

EPITAXIAL STRESSES; METAL-INSULATOR (MI) TRANSITION;

ULTRATHIN FILMS;

EID: 0344875122     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ssc.2003.10.024     Document Type: Article

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