Depth profiling of iron impurities on GaAs surfaces using total reflection X-ray fluorescence

Fresenius' Journal of Analytical Chemistry

Volumn 354, Issue 2, 1996, Pages 193-194

  Fan, Q M ^a   Liu, Y W ^a   Wei, C L ^a  

^a INSTITUTE OF HIGH ENERGY PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0344786157     PISSN: 09370633     EISSN: None     Source Type: Journal    
DOI: 10.1007/PL00012719     Document Type: Article

References (6)

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2. Gohshi Y (1991) Nucl Instrum Methods A303:544
3. Schwenke H, Gutschke R, Knoth J, Kock M (1992) Appl Phys A54:460
4. Fan Q-M, Liu Y-W, Li D-L, Wei C-L (1993) Fresenius J Anal Chem 345:518
5. Tertian R, Broll N (1984) X-ray Spectrum 13:134
6. Fan Q-M, Liu Y-W, Li D-L, Wei C-L (1990) Spectrosc Spectral Anal 10:64