Model reduction for a tungsten chemical vapor deposition system

Proceedings of the American Control Conference

Volumn 3, Issue , 1998, Pages 1365-1366

  Chang, Hsiao Yung ^a   Adomaitis, Raymond A ^a  

^a UNIVERSITY OF MARYLAND   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITIONS (CVD); COLLOCATION TECHNIQUES; MODELING EQUATIONS; NUMERICAL TECHNIQUES; PROCESSING CYCLES; REDUCED ORDER MODELS; SYSTEM'S DYNAMICS; WEIGHTED RESIDUAL METHOD;

NONLINEAR EQUATIONS; NUMERICAL METHODS; TEMPERATURE MEASUREMENT; TUNGSTEN; VAPORS;

CHEMICAL VAPOR DEPOSITION;

EID: 0344719230     PISSN: 07431619     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ACC.1998.707033     Document Type: Conference Paper

References (5)

1. Aling, H., S. Banerjee, A. K. Bangia, V. Cole, J. L. Ebert, A. Emami-Naeini, K. F. Jensen, I. G. Kevrekidis, and S. Shvartsman 1997, Nonlinear model reduction for simulation and control of rapid thermal processing. Proc. 1997 Amer. Control. Conf. 2233-2238.
2. Chang, H.-C. and R. A. Adomaitis 1998, Model reduction for a tungsten chemical vapor deposition reactor. Proc. DYCOPS-5 Corfu, Greece.
3. Dettori, L. D. Gottlieb, and R. Temam 1995, A nonlinear Galerkin method: The two-level Fourier-collocation case. J. Sci. Comp. 10 371-389.
4. Graham, M. D. and I. G. Kevrekidis 1996, Alternative approaches to the Karhunen-Loéve decomposition for model reduction and data analysis. Computers Chem. Enging 20 495-506.
5. Kleijn, C. R. and C. Werner 1993, Modeling of Chemical Vapor Deposition of Tungsten Films. Birkhauser-Verlag.