|
Volumn 350, Issue 1, 1999, Pages 14-20
|
Effect of substrate temperature on the texture and structure of polycrystalline Si0.7Ge0.3 films deposited on SiO2 by molecular beam deposition
|
Author keywords
[No Author keywords available]
|
Indexed keywords
CRYSTALLIZATION;
GRAIN SIZE AND SHAPE;
HIGH TEMPERATURE EFFECTS;
MOLECULAR BEAM EPITAXY;
POLYCRYSTALLINE MATERIALS;
SEMICONDUCTING SILICON COMPOUNDS;
SILICA;
SUBSTRATES;
TEXTURES;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY CRYSTALLOGRAPHY;
SILICON GERMANIDE;
SEMICONDUCTING FILMS;
|
EID: 0344718122
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(99)00223-0 Document Type: Article |
Times cited : (1)
|
References (24)
|