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Volumn 350, Issue 1, 1999, Pages 14-20

Effect of substrate temperature on the texture and structure of polycrystalline Si0.7Ge0.3 films deposited on SiO2 by molecular beam deposition

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLIZATION; GRAIN SIZE AND SHAPE; HIGH TEMPERATURE EFFECTS; MOLECULAR BEAM EPITAXY; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SUBSTRATES; TEXTURES; TRANSMISSION ELECTRON MICROSCOPY; X RAY CRYSTALLOGRAPHY;

EID: 0344718122     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00223-0     Document Type: Article
Times cited : (1)

References (24)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.