Single atom lithography and its applications

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 12 SUPPL. B, 1996, Pages 6683-6688

  Woodham, Richard G ^a   Ahmed, Haroon ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

Atom; Atomic; Lithography; Nanostructures; Retarding field; Single

Indexed keywords

EID: 0344687945     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.6683     Document Type: Article

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