Development in situ for gratings recorded in photoresist

Applied Optics

Volumn 42, Issue 34, 2003, Pages 6877-6879

  Rayas, Juan Antonio ^a   Martínez, Amalia ^a   Rodríguez Vera, Ramón ^a   Calixto, Sergio ^a  

^a CENTRO DE INVESTIGACIONES EN ÓPTICA   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIFFRACTION GRATINGS; ELECTROMAGNETIC WAVE DIFFRACTION; HIGH TEMPERATURE EFFECTS; HOLOGRAPHIC INTERFEROMETRY; LIGHT INTERFERENCE; MOIRE FRINGES; OPTICAL SYSTEMS;

DISPLACEMENT FIELDS; SPURIOUS FRINGES;

PHOTORESISTS;

EID: 0344686363     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.42.006877     Document Type: Article

References (11)

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