Selective epitaxial growth of dot structures on patterned Si substrates by gas source molecular beam epitaxy

Semiconductor Science and Technology

Volumn 14, Issue 3, 1999, Pages 257-265

  Kim, Eun Soo ^a   Usarni, Noritaka ^a   Shiraki, Yasuhiro ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ETCHING; MOLECULAR BEAM EPITAXY; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON; SEMICONDUCTOR GROWTH; SILICA;

DOT STRUCTURE; SELECTIVE EPITAXIAL GROWTH;

SEMICONDUCTOR QUANTUM DOTS;

EID: 0344641962     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/14/3/009     Document Type: Article

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