Characterization of RF-sputtered platinum films from industrial production plants using slow positrons

Applied Surface Science

Volumn 149, Issue 1, 1999, Pages 198-203

  Osipowicz, A ^a   Harting M ^b   Hempel, M ^b   Britton, D T ^b   Bauer Kugelmann, W ^c   Triftshauser W ^c  

^a Fak für Elektrotechnik   (Germany)

^b UNIVERSITY OF CAPE TOWN   (South Africa)

^c BUNDESWEHR UNIVERSITY MUNICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ANNEALING; CRYSTAL DEFECTS; DOPPLER EFFECT; GRAIN SIZE AND SHAPE; PLATINUM; POSITRONS; SPECTROSCOPIC ANALYSIS; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS; X RAY CRYSTALLOGRAPHY;

DOPPLER BROADENING SPECTROSCOPY;

METALLIC FILMS;

EID: 0344641959     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00200-7     Document Type: Article

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