Ultrahigh vacuum sample heating stage for molecular beam epitaxy applications with transfer mechanism to a remote scanning tunneling microscope

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 3, 1998, Pages 1258-1260

  Mendus, T ^a   Chambers, A ^a  

^a UNIVERSITY OF YORK   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0344562726     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589997     Document Type: Article

References (10)

1. R. Raval, M. A. Harrison, D. A. King, and G. Caine, J. Vac. Sci. Technol. A 9, 345 (1991).
2. X.-S. Wang, C. Huang, V. Bressler-Hill, R. Maboudian, and W. H. Weinberg, J. Vac. Sci. Technol. A 11, 2860 (1993).
3. J. P. Hobson and E. V. Kornelsen, J. Vac. Sci. Technol. 16, 701 (1979).
4. F. Osaka, T. Ishikawa, N. Tanaka, M. Lopez, and I. Matsuyama, J. Vac. Sci. Technol. B 12, 2894 (1994).
5. Omicron Vakuumphysik GmbH, Idsteiner Str. 78, D-65232 Taunusstein, Germany.
6. D. J. D. Sullivan and A. D. Kummel, Rev. Sci. Instrum. 63, 4285 (1992).
7. Goodfellow Cambridge Ltd., Cambridge Science Park, Cambridge CB4 4DJ, UK.
8. Relats UK Ltd., Sufflex Estate Risca, Newport, GWENT, UK.
9. Applied Kilovolts Ltd., 38-40 Eastbrook Rd., Portslade, Sussex BN41 1PB, UK.
10. Philips Thermocoax, York Street, Cambridge CB1 2SH, UK.