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Volumn 54, Issue 2, 1999, Pages 131-134

Effect of degree of order of silicon dioxide on localization processes of non-equilibrium charge carriers under the influence of gamma-radiation

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE CARRIERS; CHARGE TRANSFER; DEFECTS; GAMMA RAYS; MOLECULAR STRUCTURE; RADIATION EFFECTS;

EID: 0344527742     PISSN: 0969806X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0969-806X(98)00248-5     Document Type: Article
Times cited : (4)

References (7)
  • 2
    • 0018107283 scopus 로고
    • Defects and impurities in alpha-quartz and fused silica
    • Ed. Pantelides ST. Pergamon Press
    • 2 and its Interfaces. Ed. Pantelides ST. Pergamon Press, p. 232. .
    • (1978) 2 and Its Interfaces , pp. 232
    • Griscom, D.L.1
  • 3
    • 0345663304 scopus 로고
    • A model for radiation-induced charge trapping in the oxide layer of MOS devices
    • Guin, C.W., 1969. A model for radiation-induced charge trapping in the oxide layer of MOS devices. J. Appl. Phys. 140 (12), 4792.
    • (1969) J. Appl. Phys. , vol.140 , Issue.12 , pp. 4792
    • Guin, C.W.1
  • 5
    • 0345663302 scopus 로고
    • Comparison of long activation transfer of gamma-radiolysis of single crystalline quartz with amorphous silica
    • Miyozoky, T., Asuma, N.V., Shino, F.K., 1988. Comparison of long activation transfer of gamma-radiolysis of single crystalline quartz with amorphous silica. Radiat. Phys. Chem. 5, 695.
    • (1988) Radiat. Phys. Chem. , vol.5 , pp. 695
    • Miyozoky, T.1    Asuma, N.V.2    Shino, F.K.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.