PZT films grown by RF sputtering at high oxygen pressure

Journal of Materials Science Letters

Volumn 22, Issue 6, 2003, Pages 449-453

  Blanco, O ^a   Heiras, J ^a   Siqueiros, J M ^a   Martinez E ^a   Castellanos Guzman A G ^b  

^a UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

^b CUCEI U de G   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; FERROELECTRIC MATERIALS; FILM GROWTH; GRAIN SIZE AND SHAPE; HIGH PRESSURE EFFECTS; OXYGEN; SILICON; SPUTTER DEPOSITION; STRONTIUM COMPOUNDS; SURFACE ROUGHNESS; THIN FILMS; X RAY DIFFRACTION;

OXYGENATION;

LEAD COMPOUNDS;

EID: 0344520265     PISSN: 02618028     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1022915812773     Document Type: Article

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