Crystallization kinetics by differential scanning calorimetry under non-isothermal regime in the case of "site saturation"

Journal of Materials Processing Technology

Volumn 143-144, Issue 1, 2003, Pages 512-516

  Lopez Alemany P L ^a   Vazquez J ^a   Villares, P ^a   Jimenez Garay R ^a  

^a UNIVERSITY OF CÁDIZ   (Spain)

Author keywords

As quenched glass and reheated glass; Crystal growth; Crystallization kinetics; Glassy semiconductor; Kinetic parameters; Site saturation

Indexed keywords

CRYSTAL GROWTH; CRYSTALLIZATION; DIFFERENTIAL SCANNING CALORIMETRY; QUENCHING; SEMICONDUCTOR MATERIALS; THERMOANALYSIS;

CRYSTALLIZATION KINETICS; SITE SATURATION;

MATERIALS SCIENCE;

EID: 0344496923     PISSN: 09240136     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-0136(03)00308-X     Document Type: Conference Paper

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