The use of electrochemical noise measurements to detect bad copper electrorefining conditions

Journal of Applied Electrochemistry

Volumn 33, Issue 11, 2003, Pages 1093-1098

  Veilleux, B ^a   Lafront, A M ^a   Ghali, E ^a   Roberge, P R ^b  

^a UNIVERSITÉ LAVAL   (Canada)

^b ROYAL MILITARY COLLEGE OF CANADA   (Canada)

Author keywords

Additives; Chloride; Copper electrorefining; Electrochemical noise measurements (EN); Frequency domain transforms; Gelatin; Glue; Kurtosis; Skewness; Statistical analysis; Thiourea

Indexed keywords

ADDITIVES; COPPER; ELECTROCHEMISTRY; ELECTRODEPOSITION; ELECTROLYTES; FREQUENCY DOMAIN ANALYSIS; SPURIOUS SIGNAL NOISE; STATISTICAL METHODS; TIME DOMAIN ANALYSIS;

ELECTROCHEMICAL NOISE MEASUREMENT; FREQUENCY DOMAIN TRANSFORMS; GALVANOSTATIC EXPERIMENTS; GELATIN; THIOUREA;

METAL REFINING;

EID: 0344465267     PISSN: 0021891X     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1026266432219     Document Type: Article

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