Effect of sputter gas on the physical and magnetic microstructure of Co/Cu multilayers

Journal of Applied Physics

Volumn 79, Issue 8 PART 2B, 1996, Pages 6243-6245

  Donnet, D M ^a   Tsutsumi, K ^a,b   De Haan, P ^a   Lodder, J C ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

^b MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0344334859     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.362018     Document Type: Article

References (12)

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