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Diamond and Related Materials

Volumn 5, Issue 10, 1996, Pages 1204-1209

State of the silicon - DLC layer interface produced by plasma methods

(5) Szmidt, J a Beck, R B a Lisik, Z b Mitura, S b Sokolowska, A a

a WARSAW UNIVERSITY OF TECHNOLOGY (Poland)

b LODZ UNIVERSITY OF TECHNOLOGY (Poland)

Author keywords

CVD plasma methods; DLC Si interface

Indexed keywords

EID: 0344319453 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/0925-9635(96)00531-6 Document Type: Article

Times cited : (4)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.