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Volumn 140, Issue 2, 1993, Pages 421-427
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In‐situ X‐ray measurements of relaxation processes in Si1‐xGex layers on si substrate
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0344180000
PISSN: 00318965
EISSN: 1521396X
Source Type: Journal
DOI: 10.1002/pssa.2211400212 Document Type: Article |
Times cited : (14)
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References (13)
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