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Volumn 25, Issue 12, 2002, Pages 57-68
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Low-k drives new stripping solutions
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
COPPER OXIDES;
ETCHING;
GLASS;
INTEGRATED CIRCUIT MANUFACTURE;
INTERFACES (MATERIALS);
OPTIMIZATION;
PERMITTIVITY;
PHOTORESISTS;
PLASMA APPLICATIONS;
SPUTTERING;
STRIPPING (REMOVAL);
ARCH CHEMICALS (CO);
ORGANOSILICATE GLASS (OSG) FILMS;
POST-ETCH RESIDUES;
RESIDUE REMOVAL;
DIELECTRIC FILMS;
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EID: 0344095744
PISSN: 01633767
EISSN: None
Source Type: Journal
DOI: None Document Type: Review |
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Times cited : (14)
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References (0)
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