Influence of oxygen plasma on electrical and physical parameters of Au-oxide-n-InP structures

Journal of Applied Physics

Volumn 94, Issue 10, 2003, Pages 6574-6578

  Touhami, R ^a   Ravelet, S ^b   Yagoub, M C E ^c   Baudrand, H ^d  

^a UNIVERSITY OF SCIENCES AND TECHNOLOGY HOUARI BOUMEDIENE   (Algeria)

^b INSTITUT JEAN LAMOUR   (France)

^c UNIVERSITY OF OTTAWA   (Canada)

^d UNIVERSITÉ DE TOULOUSE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELECTRON TUNNELING; OXIDATION; PERMITTIVITY; PLASMAS; REFRACTIVE INDEX; SEMICONDUCTING INDIUM COMPOUNDS; THERMAL EFFECTS; THERMIONIC EMISSION; THICK FILMS; TUNING;

RICHARDSON CONSTANT;

GOLD COMPOUNDS;

EID: 0344084238     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1615305     Document Type: Article

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