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Volumn 42, Issue 6, 1999, Pages 1141-1146
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Optimization of inlet concentration profile for uniform deposition in a cylindrical chemical vapor deposition chamber
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Author keywords
[No Author keywords available]
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Indexed keywords
OPTIMIZATION;
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EID: 0344052679
PISSN: 00179310
EISSN: None
Source Type: Journal
DOI: 10.1016/S0017-9310(98)00176-8 Document Type: Article |
Times cited : (12)
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References (9)
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