A simple method for fabrication of high speed vertical cavity surface emitting lasers

Materials Science and Engineering: B

Volumn 106, Issue 1, 2004, Pages 101-104

  Yu, Hsin Chieh ^a   Chang, Shoou Jinn ^a   Su, Yan Kuin ^a   Sung, Chia Pin ^b   Lin, Yu Wei ^b   Yang, Hung Pin ^b   Huang, Chun Yuan ^b,c   Wang, Jin Mei ^b  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^c NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Far field pattern; L I V; Life test; VCSEL

Indexed keywords

ETCHING; FABRICATION; OXIDES; POLYIMIDES; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTOR DOPING; SEMICONDUCTOR QUANTUM WELLS; SUBSTRATES; VAPOR PHASE EPITAXY;

FAR FIELD PATTERN; VERTICAL CAVITY SURFACE EMITTING LASERS (VCSEL);

LASERS;

EID: 0344014307     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2003.09.020     Document Type: Article

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