Modeling of the deposition of stoichiometric Al2O3 using nonarcing direct current magnetron sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 3, 1998, Pages 1286-1292

  Macak K ^a   Nyberg, T ^b   Macak P ^a   Olsson, M Kharrazi ^b   Helmersson, U ^a   Berg, S ^b  

^a LINKÖPING UNIVERSITY   (Sweden)

^b UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0343965172     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581275     Document Type: Article

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