Implantation of silicon ions into a surface layer of the Ti6A14V titanium alloy and its effect upon the corrosion resistance and structure of this layer

Journal of Materials Science

Volumn 35, Issue 3, 2000, Pages 767-775

  Baszkiewicz, J ^a   Kaminski M ^a   Kozubowski, J ^a   Krupa, D ^a   Gosiewska, K ^a   Barcz, A ^b   Gawlik, G ^b   Jagielski, J ^b  

^a WARSAW UNIVERSITY OF TECHNOLOGY   (Poland)

^b Department of Micro and Nanotechnology of Wide Bandgap Semiconductors   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CORROSION RESISTANCE; ELECTROCHEMISTRY; HEATING; ION IMPLANTATION; PITTING; SILICON; SODIUM CHLORIDE; SURFACE STRUCTURE; THERMAL EFFECTS; TRANSMISSION ELECTRON MICROSCOPY;

AMORPHOUS PHASE; ION BEAM ENERGY;

TITANIUM ALLOYS;

EID: 0343810500     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1004721721359     Document Type: Article

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