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Volumn 164, Issue , 2000, Pages 854-860

Sputtering yield and dynamical analysis of Ni(1 0 0) surface: A comparison of four different Ar-surface interaction potentials

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; COMPUTER SIMULATION; KINETIC ENERGY; NICKEL; PROBABILITY DISTRIBUTIONS; SPUTTERING;

EID: 0343777324     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)01109-X     Document Type: Article
Times cited : (7)

References (14)
  • 2
    • 0002321984 scopus 로고
    • Fundamental Processes in Sputtering of Atoms and Molecules
    • (Ed.), (SPUT92);
    • P. Sigmund (Ed.), Fundamental Processes in Sputtering of Atoms and Molecules (SPUT92); K. Dan, Vidensk. Selsk. Mat. Fys. Medd. 43 (1993).
    • (1993) K. Dan, Vidensk. Selsk. Mat. Fys. Medd. , vol.43
    • Sigmund, P.1
  • 3
    • 0003127710 scopus 로고
    • in: R. Berrisch (Ed.), Springer, Berlin
    • P. Sigmund, in: R. Berrisch (Ed.), Topics in Applied Physics, Vol. 47, Springer, Berlin, 1981, p. 9.
    • (1981) Topics in Applied Physics , vol.47 , pp. 9
    • Sigmund, P.1
  • 13
    • 85031561991 scopus 로고    scopus 로고
    • in: R.W. Siegal, J.R. Weetman, R. Sinclair (Eds.), Materials Research Society, Pittsburg
    • A.F. Voter, S.P. Chen, in: R.W. Siegal, J.R. Weetman, R. Sinclair (Eds.), MRS Symp Proc No: 82, Materials Research Society, Pittsburg, p. 175.
    • MRS Symp Proc No: 82 , pp. 175
    • Voter, A.F.1    Chen, S.P.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.