Possibilities to increase the resolution of photoelectric incremental rotary encoders

Materials Science in Semiconductor Processing

Volumn 3, Issue 5-6, 2000, Pages 557-561

  Dumbravescu N ^a   Schiaua, S ^b  

^a NATIONAL INSTITUTE FOR RESEARCH AND DEVELOPMENT IN MICROTECHNOLOGIES   (Romania)

^b CEFIN Bucharest   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROLESS PLATING; ELECTROMAGNETIC WAVE DIFFRACTION; MASKS; PHOTOELECTRICITY; STRESS ANALYSIS; TRANSDUCERS;

PHOTOELECTRIC INCREMENTAL ROTARY ENCODERS;

INTEGRATED OPTOELECTRONICS;

EID: 0343774108     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(00)00084-6     Document Type: Article

References (8)

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