End-point detection using focused ion beam-excited photoemissions in milling deep small holes in large scale integrated circuit structures

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 4, 1998, Pages 2555-2561

  Yamaguchi, Hiroshi ^a   Saitoh, Keiya ^a   Mizumura, Michinobu ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0343757387     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590209     Document Type: Article

References (9)

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