Properties and applications of the "epitaxial shadow mask molecular beam epitaxy technique"

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 3, 1996, Pages 2175-2179

  Malzer, S ^a   Kneissl, M ^a   Kiesel, P ^a   Gulden, K H ^b   Wu, X X ^c   Smith, J S ^c   Dohler G H ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^b PAUL SCHERRER INSTITUTE   (Switzerland)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0343702244     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588893     Document Type: Article

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