Rates of metal electrodeposition from aqueous solutions in the presence of chelating agents

Separation Science and Technology

Volumn 35, Issue 7, 2000, Pages 1087-1098

  Juang, Ruey Shin ^a   Lin, Li Chun ^a  

^a YUAN ZE UNIVERSITY   (Taiwan)

Author keywords

Cation exchange membrane; Chelating agents; Cu(II); Electrodeposition; Initial rates

Indexed keywords

ACETIC ACID; CHELATION; COPPER; CURRENT DENSITY; ELECTROCHEMICAL ELECTRODES; ION EXCHANGE MEMBRANES; IRIDIUM COMPOUNDS; ORGANIC ACIDS; PH; PLATINUM; SOLUTIONS;

CHELATING AGENTS; DEPOSITION RATE; ELECTROCHEMICAL MEMBRANE CELL; IRIDIUM OXIDE; METAL ELECTRODEPOSITION; TITANIUM ELECTRODES;

ELECTRODEPOSITION;

CITRIC ACID; COPPER; EDETIC ACID; IRIDIUM; METAL OXIDE; NITRILOTRIACETIC ACID; PLATINUM; TITANIUM;

AQUEOUS SOLUTION; COPPER; ELECTRODEPOSITION; METAL EXTRACTION;

ARTICLE; CATION EXCHANGE; CHELATION; CONCENTRATION RESPONSE; ELECTRIC CURRENT; ELECTRODE; PH; REACTION ANALYSIS; STOICHIOMETRY; VALIDATION PROCESS;

EID: 0343619513     PISSN: 01496395     EISSN: None     Source Type: Journal    
DOI: 10.1081/SS-100100213     Document Type: Article

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