The effect of absorbing resins on substrate concentration and enantiomeric excess in yeast reduction

Tetrahedron Asymmetry

Volumn 8, Issue 14, 1997, Pages 2375-2379

  D'Arrigo, Paola ^a   Fantoni, Giuseppe Pedrocchi ^a   Servi, Stefano ^a   Strini, Alberto ^a  

^a CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ORGANIC SOLVENT; RESIN;

ABSORPTION; ARTICLE; CONTROLLED STUDY; ENANTIOMER; ENZYME SUBSTRATE; FERMENTATION; NONHUMAN; PRIORITY JOURNAL; REDUCTION; SACCHAROMYCES CEREVISIAE; TECHNIQUE;

EID: 0343580463     PISSN: 09574166     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0957-4166(97)00257-7     Document Type: Article

References (15)

1. Servi, S. Chim. Ind., 1996, 78, 959-963.
2. Kula, M.R. Proceedings Chiral Europe, 1994, 27-33.
3. Shieh, W.R.; Gopalan, A.S.; Sih, C.J. J. Am. Chem. Soc., 1985, 107, 2993.
4. Chen, C.S.; Zhou, B.N.; Girdaukas, G.; Shieh, W.R.; VanMiddlesworth, F.; Gopalan, A.S.; Sih, C.J. Bioorg. Chem., 1984, 12, 98-117.
5. Nakamura, K.; Inoue, K.; Ushio, K.; Oka, S.; Ohno, A. Chemistry Letters, 1987, 679. Ushio, K.; Hada, J.; Tanaka, Y.; Ebara, K. Enzyme Microb, Technol., 1993,
6. Nakamura, K.; Inoue, K.; Ushio, K.; Oka, S.; Ohno, A. Chemistry Letters, 1987, 679. Ushio, K.; Hada, J.; Tanaka, Y.; Ebara, K. Enzyme Microb, Technol., 1993,
7. Sheldon, R. A. Chirotechnology, 1993, Marcel Dekker Inc. N.Y., pp 159 and 374.
8. Seebach, D.; Sutter, M.A.; Weber, R.H.; Züger, M.F. Org. Synth., 1984, 63, 1-9.
9. Wipf, R.; Kupfer, E.; Bertazzi, R.; Leuenberger, H.G.W. Helv. Chim. Acta, 1983, 66, 485.
10. Liese, A.; Karutz, M.; Kamphuis, J.; Wandrey, C.; Kragl, U. Biotechnol Bioeng., 1996, 51, 544-550
11. Kometani, T.; Yoshii, H.; Kitatsuji, E.; Nishimura, H.; Matsuno, R. J. Ferment. Bioeng., 1993, 76, 33-37.
12. Andersen, B.H.; Hansen, M.M.; Harkness, A.R.; Henry, C.L.; Vicenzi, J.T.; Zmijewski, M.J. J. Am. Chem. Soc., 1995, 117, 12358-12359.
13. Nakamura, K.; Inoue, K.; Ushio, K.; Oka, S.; Ohno, A. J. Org. Chem., 1988, 53, 2589-2593. Nakamura, K.; Inoue, K.; Ohno, A. Tetrahedron Lett., 1995, 36, 265-266. Nakamura, K.; Kondo, S.I.; Kawai, Y.; Ohno, A. Tetrahedron Lett., 1991, 32, 7075-7078.
14. Nakamura, K.; Inoue, K.; Ushio, K.; Oka, S.; Ohno, A. J. Org. Chem., 1988, 53, 2589-2593. Nakamura, K.; Inoue, K.; Ohno, A. Tetrahedron Lett., 1995, 36, 265-266. Nakamura, K.; Kondo, S.I.; Kawai, Y.; Ohno, A. Tetrahedron Lett., 1991, 32, 7075-7078.
15. Nakamura, K.; Inoue, K.; Ushio, K.; Oka, S.; Ohno, A. J. Org. Chem., 1988, 53, 2589-2593. Nakamura, K.; Inoue, K.; Ohno, A. Tetrahedron Lett., 1995, 36, 265-266. Nakamura, K.; Kondo, S.I.; Kawai, Y.; Ohno, A. Tetrahedron Lett., 1991, 32, 7075-7078.