Silicon interstitial trapping in polycrystalline silicon films studied by monitoring interstitial reactions with underlying insulating films

Applied Physics Letters

Volumn 68, Issue 11, 1996, Pages 1549-1551

  Tsoukalas, D ^a   Kouvatsos, D ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0343534617     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.115695     Document Type: Article

References (7)

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