New phases of amorphous carbon and silicon films obtained by low energy cluster beam deposition

Materials Science and Engineering: A

Volumn 217-218, Issue , 1996, Pages 69-73

  Melinon, P ^a   Prevel, B ^a   Dupuis, V ^a   Perez, A ^a   Champagnon, B ^a   Guyot, Y ^a   Boudeulle, M ^a   Pellarin, M ^a   Dugourd, P ^a   Broyer, M ^a  

^a UNIVERSITÉ LYON 1   (France)

Author keywords

Amorphous films; Carbon; Low energy cluster beam deposition; Silicon

Indexed keywords

AMORPHOUS SILICON; CARBON; CHEMICAL BONDS; COMPUTER SIMULATION; DEPOSITION; FILM GROWTH; MOLECULAR DYNAMICS; PHASE COMPOSITION; RAMAN SPECTROSCOPY; SHAPE MEMORY EFFECT; X RAY PHOTOELECTRON SPECTROSCOPY;

BALLISTIC DEPOSITION; LASER VAPORIZATION SOURCE; LOW ENERGY CLUSTER BEAM DEPOSITION;

AMORPHOUS FILMS;

EID: 0343520996     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5093(96)10363-4     Document Type: Article

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