Piezoresistive silicon V-AFM cantilevers for high-speed imaging

Sensors and Actuators, A: Physical

Volumn 76, Issue 1-3, 1999, Pages 139-144

  Su, Y ^a   Brunnschweiler, A ^a   Evans, A G R ^a   Ensell, G ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; FABRICATION; IMAGING TECHNIQUES; MAGNETIC FIELD EFFECTS; MATHEMATICAL MODELS; OPTIMIZATION; RESISTORS; SENSITIVITY ANALYSIS; SIGNAL TO NOISE RATIO;

CANTILEVERS; HIGH SPEED IMAGING; PIEZORESISTIVE SENSITIVITY; PIEZORESISTIVE SENSORS;

SILICON SENSORS;

EID: 0343496775     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(98)00371-9     Document Type: Article

References (5)

1. Minne S.C., Flueckiger Ph., Soh H.T., Quate C.F. Atomic force microscope lithography using amorphous silicon as a resist and advances in parallel operation. J. Vac. Sci. Technol. B. 13:1995;1380-1385.
2. Kado H., Tohda T. Nanometer-scale recording on chalcogenide films with an atomic force microscope. Appl. Phys. Lett. 66:1995;2961.
3. Barrett R.C., Quate C.F. High-speed, large-scale imaging with the atomic force microscope. J. Vac. Sci. Technol. B. 9:1991;302-306.
4. Manalis S.R., Minne S.C., Quate C.F. Atomic force microscopy for high speed imaging using cantilevers with an integrated actuator and sensor. Appl. Phys. Lett. 68(6):1996;871-873.
5. Su Y., Evans A.G.R., Brunnschweiler A., Ensell G. Fabrication of improved piezoresistive silicon cantilever probes for the atomic force microscope. Sensors and Actuators A. 60:1997;163-167.