Structural and surface studies of tin oxide films doped with fluorine

Thin Solid Films

Volumn 375, Issue 1-2, 2000, Pages 147-150

  Acosta, D R ^a   Estrada, W ^b   Castanedo, R ^c   Maldonado, A ^c   Valenzuela, M A ^d  

^a UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

^b Laboratorio de Bioinformática   (Peru)

^c DEPARTAMENTO DE FÍSICA   (Mexico)

^d INSTITUTO POLITÉCNICO NACIONAL   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; FLUORINE; HIGH RESOLUTION ELECTRON MICROSCOPY; MORPHOLOGY; PYROLYSIS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING GLASS; SEMICONDUCTING TIN COMPOUNDS; SEMICONDUCTOR DOPING; SUBSTRATES;

SURFACE TOPOLOGY;

SEMICONDUCTING FILMS;

EID: 0343408452     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01262-1     Document Type: Article

References (4)

1. Acosta D.R., Zironi E.P., Montoya E., Estrada W. Thin Solid Films. 228:1996;1.
2. Miki-Yoshida M., Andrade E. Thin Solid Films. 224:1993;87.
3. Fantini M., Torriani I. Thin Solid Films. 224:1986;255.
4. H. Bedon, R. Eklund, W. Estrada, Proceedings of the 5th Latin American Conference on Applications of Mossbauer Effect, Cuzco, PERU, (1996), 124.