Characterization of lead zirconate titanate thin films deposited at low temperature by reactive facing target sputtering

Thin Solid Films

Volumn 375, Issue 1-2, 2000, Pages 267-270

  Li, Xin Shan ^a,b   Tanaka, Tsunehisa ^a   Suzuki, Yoshihiko ^a  

^a OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE   (Japan)

^b SHANGHAI UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; FERROELECTRIC MATERIALS; LEAD COMPOUNDS; LOW TEMPERATURE EFFECTS; PEROVSKITE; PHASE COMPARATORS; PRESSURE EFFECTS; SILICON; SPUTTER DEPOSITION; THIN FILMS;

LEAD ZIRCONATE TITANATE; REACTIVE FACING TARGET SPUTTERING;

DIELECTRIC FILMS;

EID: 0343408423     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01220-7     Document Type: Article

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