Formation of visible photoluminescence bands in Si+-implanted silica glasses and thermal oxide films on crystalline Si

Journal of Non-Crystalline Solids

Volumn 187, Issue , 1995, Pages 112-118

  Shimizu Iwayama, Tsutomu ^a   Fujita, Katsunori ^a   Akai, Mitsuru ^a   Nakao, Setsuo ^b   Saitoh, Kazuo ^b  

^a AICHI UNIVERSITY OF EDUCATION   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0343353764     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-3093(95)00122-0     Document Type: Article

References (29)

1. Laser-induced fluorescence and nonlinear optical properties of ion-implanted fused silica
2. Three-Dimensional Quantum Well Effects in Ultrafine Silicon Particles
3. Current-induced light emission from a porous silicon device
4. Semi-Insulating Polycrystalline-Silicon (SIPOS) Passivation Technology