Diode lasers monitor vapor deposition

Laser Focus World

Volumn 32, Issue 11, 1996, Pages 95-104

  Bortz, Michael ^a   Day, Tim ^a  

^a New Focus Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; DATA ACQUISITION; INDUSTRIAL APPLICATIONS; PROCESS CONTROL; REAL TIME SYSTEMS; SENSORS; VAPOR DEPOSITION;

ATOMIC ABSORPTION SENSORS; DERIVATIVE SPECTROSCOPY; EXTERNAL CAVITY DIODE LASERS (ECDL); NONLINEAR SPECTROSCOPY; TUNABLE DIODE LASERS;

SEMICONDUCTOR LASERS;

EID: 0343346505     PISSN: 10438092     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (8)

1. S. J. Benerofe et al., J. Vac. Sci. Technol. B12, 1217 (1994).
2. A. Chalmers and K. P. Killeen, Appl. Phys. Lett. 63, 3131 (1993).
3. P. Pinsukanjana, S. A. Chalmers, L. Coldren, and A. Gossard, "Real-Time Optical-Based Flux Monitoring of Al, Ga, and In for MBE," submitted to Applied Physics Letters.
4. M. L. Bortz et al., IEEE J. Quantum Electron. 30, 2953 (1994).
5. M. M. Fejer, G. A. Magel, D. H. Jundt, and R. L. Byer, IEEE J. Quantum Electron. 28, 1631 (1992).
6. M. L. Bortz et al., Appl. Phys. Lett. 67(10), 1375 (Sept. 1995).
7. M. L. Bortz et al., Appl. Phys. Lett. 68, 729 (Feb. 1996).
8. S. Galanti, L. Berzins, B. Tamosiatis, and M. L. Bortz, "Frequency Doubled Diode Laser Based Absorption Sensor for Evaporation Rate Control of Titanium," presented at Photonics West, San Jose, CA (January 1996).